I’ve read the tutorial on using an unpolarized beam, and how to generate my results.
In the script file provided with the tutorial at
They calculate this by simulating a beam with a polarization angle of 0 and then a beam with a polarization of angle 90, they then get the quantity <|E|2> referring to the time averaged electric field intensity of the unpolarized beam source as,
<|E|2> = 0.5 (<|E_0|>^2 + <|E_90|>^2)
In the script for the unpolarized beam they do the same additions for calculating transmission.
So, now if I’m simulating a gold nanoparticle of 10 nm radius, and follow the same procedure, while calculating the reflectance and transmission in each case using field and profile monitors. In order to get the averaged electric field intensity, all I have to do is something along the lines of:
R_unpol = 0.5*(R_0+R_90);
Are the E2_0 and E2_90 referring to the E abs^2 variable in the field and profile monitor? Must I apply these same additions if I’m calculating power absorption or scattering/absorption cross sections using the pabs, and cross section analysis monitors?