I have a question about using the global source shutter option in a transient heat analysis with a uniform heat source. Could you please help figure out what is the issue here. Please see the DEVICE file fromt he gdrive link below.
I have specified a TiW heater (in contact with Air, sitting on SiO2 layer) as the heat source, and applied uniform heat source to the volume of TiW.
I am now trying to use the global source shutter to turn on/off the heat source and analyze the transient response of heat transfer.
However, from the T plot, it seems the heat source is not observing the shutter correctly, the Tempreature profile at time 0 ~ 1.5us is the same result as the steady state result, as if the shutter has been on all the time. And the T response does not make sense as t increases.
I 'd appreciate any input to help understand the global shutter function.