Is it possible to design the “prism-photoresist-substrate” model in FDTD for surface plasmon interference lithography?
Sorry for a late reply. Can you please provide more info regarding the geometry? We have an example in KB that might be useful for your review:
With the required geometry I have design the model model new.fsp (312.8 KB)
The monitor_1 that is the line monitor gives the Electric field intensity at the interface(prism-photoresist). I want uniform type of peaks for a distance of 1-micron that is I want longer pattern length with uniform intensity (E).
For monitor_2 we get the interference pattern but I want the patterns as shown in the figure below
Can you help me with this simulation?