I am trying to work on plasmonic solar cell. I have read plasmonic solar cell part of knowledge base and also run the .fsp file of plasmonic solar cell given on the KB.
I have some questions:
what is the thickness of the Si absorber layer (in the .fsp it is named as ‘substrate’)? which field defines the Si thickness…x span? y span? or z span?..or anything else?
what should I do if I want to take a Si substrate with 3 micrometer thickness?
I noticed in the .fsp file, the ‘bottom_monitor’ is placed bellow 0.5um from the top surface. what is reason behind this? To measure the bottom surface transmission if I want to place a bottom monitor at the bottom level of the Si substrate (thickness 3um), where should I place the monitor?
I also want to know about the position of ‘FDTD’ simulation region. specifically its geometrical settings. What is the relation between the Si substrate thickness and position of FDTD simulation region?
Your suggestions would be very helpful for me.