I am using the TFSF source to simulate scattering from a random distribution of spheres (r=100nm) at a central wavelength of 600nm. I noticed some anomalies with a power transmission box placed outside the TFSF source (it gave me values>1, which should not be the case) and decided to add power monitors to study the power distribution at various points in the simulations.
In particular, one power monitor was placed just inside the TFSF source, and the other was placed, just outside it. The power measured by the power monitor outside the TFSF source is larger than the power monitor placed inside it. Since the field outside the TFSF source consists of only the scattered field, I expected that it would have less power than within the TFSF source. Could I please find out why the results are as such?
Plot of the power inside and outside of the source:
Simulation file: RandomMediaTest_v3.fsp (314.9 KB)