I am trying to simulate the Metal-Insulator-metal junction from the paper - " Highly efficient on-chip direct electronic–plasmonic transducers" (attached). More specifically I am trying to simulate the structure in fig. S10-S13 given in its supplementary paper(attached). I am facing difficulties with the results not matching the paper. I am attaching my .fsp file and would like you to have a look at it.
I’d also like to replicate the graph, Fig 2e from the main paper. Any insights regarding the approach for different voltages applied would be helpful.
P.S- I’ve used all the sources and monitors in the same file. Enable and disable them according to the simulation