I am attempting to get the far field projection of a dipole that has part of its emission being redirected by a metal lens reflector.
I started using the file to understand the far field projections. I see there is the single monitor method and the box of monitors method. I was able to reproduce the analytical expected results from the dipole in the homogeneous environment using the box of monitors.
When I try the single monitor method, the result does not quite match up as expected. Please see the attached far field polar plots from the XY halfplane below the surface. Filename: basic_test_lumerical_monitor_farfield.jpg is for the single monitor farfield in the XY_halfplane
Filename: basic_test_lumeical_box_farfield.jpg is using the analysis group for far field box scat_ff and the usr_farfield_symmetry script supplied on the website.
Is this due to simulation size, resolution, or mesh size? Or that the single monitor is too far away from the source so that the field is absorbed by pml before reaching the monitor? I tried placing a far field monitor closer to the dipole and the resulting far field was different. The reason I want to trust the single monitor is because of the next part of the work.
My second set of questions is for the simulation with the lens. Can I use the box method here, or will it give incorrect results. Currently the box method and the single monitor method do not agree here either. Please see the attached simulation file: x-dipole_orientation_lens_oxidesimulation_test
While I believe the single monitor method is correct in this case, because the medium containing the monitors is homogeneous, I assumed that that box method should work as well.
Brandon Demoryusr_farfield_symmetry.fsp (4.3 MB)x-dipole_orientation_lens_oxidesimulation_test_symmetryboundaryconditions_v3.fsp (413.7 KB)